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  • US20050277256A1 Nanolaminates of hafnium oxide and

    A dielectric film containing a HfO 2 /ZrO 2 nanolaminate and a method of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness thinner than...

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  • Nanolaminates of hafnium oxide and zirconium oxide

    A dielectric film containing a HfO 2 /ZrO 2 nanolaminate and a method of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness Nanolaminates of hafnium oxide and zirconium oxide Micron Technology, Inc.

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  • US8125038B2 Nanolaminates of hafnium oxide and

    A dielectric film containing a HfO 2 /ZrO 2 nanolaminate and a method of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness thinner than...

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  • Optical and mechanical properties of nanolaminates of

    of nanolaminates of zirconium and hafnium oxides grown by atomic layer deposition Cite as: J. Vac. Sci. Technol. A 38, 022406 (2020); doi: 10.1116/1.5131563 View Online Export Citation CrossMark Submitted: 15 October 2019 · Accepted: 27 December 2019 · Published Online: 17 January 2020 Taivo Jõgiaas,1,a) Mikk Kull,1 Helina Seemen,1 Peeter Ritslaid,1 Kaupo Kukli,1,2 and Aile Tamm1

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  • Optical and mechanical properties of nanolaminates of

    Request PDF Optical and mechanical properties of nanolaminates of zirconium and hafnium oxides grown by atomic layer deposition Nanolaminates of ZrO2 and HfO2 were grown by atomic layer

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  • Characteristics of Mixed Oxides and Nanolaminates of

    03/12/2019· Hafnium-based dielectrics are the leading candidates for replacement. 1 The XTEM micrographs comparing microstructures of mixed oxide and nanolaminates after annealing at for in are shown in Fig. 6. All films are mainly amorphous. It has been reported earlier that as-deposited mixed oxide films have very thin interfacial layers . 14 After annealing, an increase in the interfacial layer is

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  • US8125038B2 Nanolaminates of hafnium oxide and

    A dielectric film containing a HfO 2 /ZrO 2 nanolaminate and a method of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness thinner than...

    Details >
  • Nanolaminates of hafnium oxide and zirconium oxide

    A dielectric film containing a HfO 2 /ZrO 2 nanolaminate and a method of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness Nanolaminates of hafnium oxide and zirconium oxide Micron Technology, Inc.

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  • US Patent for Nanolaminates of hafnium oxide and

    A dielectric film containing a HfO2/ZrO2 nanolaminate and a method of fabricating such a dielectric film produce a reliable dielectric layer having an equivalent oxide thickness thinner than attainable using SiO2. A dielectric layer containing a HfO2/ZrO2 nanolaminate may be realized in a wide variety of electronic devices and systems.

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  • Optical and mechanical properties of nanolaminates of

    Request PDF Optical and mechanical properties of nanolaminates of zirconium and hafnium oxides grown by atomic layer deposition Nanolaminates of ZrO2 and HfO2 were grown by atomic layer

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  • Characteristics of Mixed Oxides and Nanolaminates of

    03/12/2019· Hafnium-based dielectrics are the leading candidates for replacement. 1 The XTEM micrographs comparing microstructures of mixed oxide and nanolaminates after annealing at for in are shown in Fig. 6. All films are mainly amorphous. It has been reported earlier that as-deposited mixed oxide films have very thin interfacial layers . 14 After annealing, an increase in the interfacial layer is

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  • Engineering of Ferroelectric HfO2–ZrO2 Nanolaminates

    In this work, the ferroelectric properties of nanolaminates made of HfO2 and ZrO2 were studied as a function of the deposition temperature and the individual HfO2/ZrO2 layer thickness before and after electrical field cycling. The ferroelectric response was found to depend on the structure of the nanolaminates before any postdeposition annealing treatment. After annealing with a TiN cap, an

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  • Tetrakis(dimethylamido)hafnium(IV) packaged for use in

    Used as precursor for atomic layer deposition of Hafnium Oxide nanolaminates, which are used as a reploacement for Silicon oxide in semiconductor devices. Packaging 25 g in stainless steel cylinder Safety & Documentation. Safety Information. Symbol GHS02,GHS05. Signal word Danger

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  • (PDF) Atomic layer deposition of hafnium oxide: A

    The best nanolaminates showed charge storage factors improved up to 8 times when compared with those of the single oxide films. The presence of nanosize crystallites of monoclinic and metastable

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  • Oxyde d'hafnium(IV) — Wikipédia

    L'oxyde d'hafnium(IV), ou dioxyde d'hafnium, ou encore hafnie, est un composé chimique de formule brute HfO 2. Il se présente sous la forme d'un solide incolore et est pratiquement insoluble dans l'eau et les solvants organiques. Il s'agit d'un isolant électrique

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  • Hafnium — Wikipédia

    Le hafnium est l'élément chimique de numéro atomique 72, de symbole Hf. Le hafnium ressemble chimiquement au zirconium et on le trouve dans tous les minerais de zirconium. Le corps simple hafnium est un métal de transition tétravalent d'un aspect gris argenté. On l'utilise dans les alliages de tungstène pour la confection de filaments et d'électrodes, et comme absorbeur de neutrons dans les barres de

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